A Unified Application Profile Model for Microservices-Based Applications in the Cloud-Edge Computing Continuum

dc.contributor.authorKadouma, Abdelhak
dc.contributor.authorAfolabi, Ibrahim
dc.contributor.authorShukla, Amit
dc.contributor.authorBagaa, Miloud
dc.contributor.authorKsentini, Adlen
dc.contributor.authorElmusrati, Mohammed
dc.contributor.departmentfi=Digital Economy|en=Digital Economy|
dc.contributor.orcidhttps://orcid.org/0000-0001-9304-6590
dc.date.accessioned2026-03-02T12:50:00Z
dc.date.issued2025
dc.description.abstractThe dynamic and distributed nature of the Cloud Edge Computing Continuum (CECC) necessitates innovative approaches to application profiling for microservices-based applications. Existing application profiling approaches typically address only isolated aspects, such as user behavior, system performance, or data interactions. Moreover, many rely on static representations that cannot adapt to real-time changes. These problems make it harder to manage resources properly, meet SLA requirements, and handle the full lifecycle of modern distributed applications. This paper presents a Unified Application Profile Model (APM) Template, which integrates microservices, application consumers, and data sources to create a comprehensive and adaptable model tailored for CECC environments. The proposed APM provides a formal structure, defined using OWL (Web Ontology Language), ensuring precise representation of application components and their interrelationships. This formalization aids in understanding and managing the unique challenges of CECC, including dynamic resource allocation, latency sensitivity, and scalability. Key findings demonstrate how this APM surpasses traditional profiling approaches by unifying critical application dimensions and addressing CECC-specific demands. The template sets the foundation for future research into practical implementations, including integration strategies and dynamic adaptability, positioning the APM as a significant step forward in enabling efficient and sustainable application lifecycle management for CECC environments.en
dc.description.notification©2025 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
dc.description.reviewstatusfi=vertaisarvioitu|en=peerReviewed|
dc.embargo.lift2027-12-30
dc.embargo.terms2027-12-30
dc.format.pagerange1-7
dc.identifier.isbn978-1-6654-6577-9
dc.identifier.urihttps://osuva.uwasa.fi/handle/11111/19870
dc.identifier.urnURN:NBN:fi-fe2026030217357
dc.language.isoen
dc.publisherIEEE
dc.relation.conference2025 IEEE Conference on Network Function Virtualization and Software-Defined Networking (NFV-SDN)
dc.relation.doihttps://doi.org/10.1109/nfv-sdn66355.2025.11349369
dc.relation.funderEuroopan Unionifi
dc.relation.funderEuropean Unionen
dc.relation.grantnumber101093129
dc.relation.isbn978-1-6654-6578-6
dc.relation.ispartof2025 IEEE Conference on Network Function Virtualization and Software-Defined Networking (NFV-SDN)
dc.relation.ispartofjournalIEEE Conference on Network Function Virtualization and Software-Defined Networking (NFV-SDN)
dc.relation.issn2832-2231
dc.relation.issn2832-224X
dc.relation.urlhttps://doi.org/10.1109/NFV-SDN66355.2025.11349369
dc.relation.urlhttps://urn.fi/URN:NBN:fi-fe2026030217357
dc.source.identifierdadd1e2e-b5a4-44be-9d68-49d0a73a1153
dc.source.metadataSoleCRIS
dc.subjectcloud edge computing continuum
dc.subjectmicroservices
dc.subjectapplication profile
dc.subjectontology
dc.subject.disciplinefi=Tietotekniikka tekn|en=Information Technology tech|
dc.subject.disciplinefi=Tietoliikennetekniik|en=Telecommunications|
dc.titleA Unified Application Profile Model for Microservices-Based Applications in the Cloud-Edge Computing Continuum
dc.type.okmfi=A4 Vertaisarvioitu artikkeli konferenssijulkaisussa|en=A4 Article in conference proceedings (peer-reviewed)|
dc.type.publicationarticle
dc.type.versionacceptedVersion

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